from the conferences organized by TANGER Ltd.
The structure and morphology of binary Ti-Si thin films were studied. Ti-Si surface alloys were deposited by electron beam. The Si content was controlled by the evaporation rate of Ti and Si targets. The structure was investigated by X-ray diffraction (XRD) and the morphology and surface roughness were measured by atomic force microscopy (AFM). The results show that the morphology and surface roughness reflect the structural evolution. The crystalline nature of Ti-Si thin films tends to nanocrystalline form. Higher amounts of Si resulted in an amorphous structure with a smoothed surface morphology and the lowest roughness.
Keywords: Ti-Si surface alloys, structure, surface morphology, roughness© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.