DEVELOPMENT OF PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION REACTOR FOR PREPARATION OF OXYGEN CONTAINING ORGANOSILAZANE POLYMER THIN FILMS

1 Přibyl Roman
Co-authors:
1 KELAROVÁ Štěpánka 1 Homola Vojtěch 1 BURŠÍKOVÁ Vilma
Institution:
1 Department of Physical Electronics of Masaryk University, Brno, Czech Republic, EU, romanpribyl@mail.muni.cz
Conference:
11th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 16th - 18th 2019
Proceedings:
Proceedings 11th International Conference on Nanomaterials - Research & Application
Pages:
637-641
ISBN:
978-80-87294-95-6
ISSN:
2694-930X
Published:
1st April 2020
Proceedings of the conference have been sent to Web of Science and Scopus for evaluation and potential indexing.
Metrics:
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Abstract

In the present work we focused on the development of a low pressure capacitively coupled radio-frequency PECVD reactor for preparation of plasma-polymer thin films from organosilazane precursors. The dependence of the film growth from hexamethyldisilazane (HMDSZ, SiN2C6H19) and oxygen containing mixtures on the deposition parameters was studied. The time evolution of the negative self bias voltage on the thin film growth was studied. It was found, that the changes in the self bias voltage significantly influenced the surface structure and the properties of the growing films. The mechanical properties of the films were studied using nanoindentation technique and the surface structure was studied using atomic force microscopy (AFM).

Keywords: PECVD, nanoindentation, profilometry, confocal microscopy, AFM
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