Self-assembled monolayers (SAMs) has recently received much attention because of their wide range in applications such as layers in biosensors, electronic active layers or interlayers in organic electronic devices like organic light emitting diodes (OLEDs), organic photovoltaics (OPVs), organic thin film transistors (OTFTs). Photolithography is a basic and long established technique used in the preparation of processors and other electronic components. This paper deals with patterning of self-assembled monolayers prepared on gold and silver layers using photolithography. Firstly, the prepared self-assembled monolayers were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and Fourier-transform infrared spectroscopy (FTIR). Subsequently testing patterns according to the resolution chart test were exposed by UV lithography. These prepared patterns were characterized by optical microscopy, atomic force microscopy (AFM) and scanning electron microscopy (SEM).Keywords: self-assembled monolayers, photolithography, SEM, AFM, FTIR, magnetron sputtering
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