PATTERNING OF SELF-ASSEMBLED MONOLAYERS (SAMS)

1 URBÁNEK Michal
Co-authors:
1 URBÁNEK Pavel 1 MACHOVSKÝ Michal 1 KUŘITKA Ivo
Institution:
1 Centre of Polymer Systems, Tomas Bata University in Zlin, Trida Tomase Bati 5678, 760 01 Zlin, Czech Republic, EU, murbanek@utb.cz
Conference:
11th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 16th - 18th 2019
Proceedings:
Proceedings 11th International Conference on Nanomaterials - Research & Application
Pages:
648-652
ISBN:
978-80-87294-95-6
ISSN:
2694-930X
Published:
1st April 2020
Proceedings of the conference have been sent to Web of Science and Scopus for evaluation and potential indexing.
Metrics:
19 views / 3 downloads
Abstract

Self-assembled monolayers (SAMs) has recently received much attention because of their wide range in applications such as layers in biosensors, electronic active layers or interlayers in organic electronic devices like organic light emitting diodes (OLEDs), organic photovoltaics (OPVs), organic thin film transistors (OTFTs). Photolithography is a basic and long established technique used in the preparation of processors and other electronic components. This paper deals with patterning of self-assembled monolayers prepared on gold and silver layers using photolithography. Firstly, the prepared self-assembled monolayers were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and Fourier-transform infrared spectroscopy (FTIR). Subsequently testing patterns according to the resolution chart test were exposed by UV lithography. These prepared patterns were characterized by optical microscopy, atomic force microscopy (AFM) and scanning electron microscopy (SEM).

Keywords: self-assembled monolayers, photolithography, SEM, AFM, FTIR, magnetron sputtering
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