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PHOTOLITOGRAPHY ON FLEXIBLE SUBSTRATES

1 URBÁNEK Michal
Co-authors:
1 URBÁNEK Pavel 1 KUŘITKA Ivo 2 KOLAŘÍK Vladimír
Institutions:
1 Centre of Polymer Systems, University Institute, Tomas Bata University in Zlín, Třída T. Bati 5678, 760 01 Zlín, Czech Republic, murbanek@cps.utb.cz
2 Institute of Scientific Instruments of the ASCR, v.v.i., Královopolská 147, 612 64 Brno, Czech Republic
Conference:
9th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 18th - 20th 2017
Proceedings:
Proceedings 9th International Conference on Nanomaterials - Research & Application
Pages:
914-917
ISBN:
978-80-87294-81-9
ISSN:
2694-930X
Published:
8th March 2018
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
580 views / 205 downloads
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Abstract

Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates.

Keywords: photolithography, flexible substrates, metal layer

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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