FORMATION OF ORGANOSILICON NANOPARTICLES IN A GAS AGGREGATION SOURCE AS WITNESSED BY IN SITU LIGHT SCATTERING

1 SHELEMIN Artem
Co-authors:
2 PEREKRESTOV Roman 1 VAIDULYCH Mykhailo 1 NIKITIN Daniil 1 CHOUKOUROV Andrei 1 SLAVINSKA Danka 1 BIEDERMAN Hynek
Institutions:
1 Department of Macromolecular Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, 180 00, Prague, Czech Republic, EU
2 Department of Low-Temperature Plasma, Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 182 21, Prague 8, Czech Republic, EU
Conference:
9th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 18th - 20th 2017
Proceedings:
Proceedings 9th International Conference on Nanomaterials - Research & Application
Pages:
937-941
ISBN:
978-80-87294-81-9
ISSN:
2694-930X
Published:
8th March 2018
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
584 views / 267 downloads
Abstract

In this work, we applied a method of light scattering for in situ detection of organosilicon nanoparticles (NPs). Plasma polymerization of hexamethyldisiloxane (HMDSO) in its 10 % mixture with Ar was used to synthesize the NPs by means of a gas aggregation cluster source (GAS). The total pressure of 45 Pa and the RF discharge power in a range of 20 – 80 W were used. The GAS was constructed to allow passing of a laser beam (446 nm) across the beam of the NPs at the distance of 2 cm behind the exit orifice and acquiring the scattered light either by an optical emission spectrometer or by a CCD camera. Although for 20 W power constant intensity of the scattered light was obtained, cycling instabilities were detected for higher power. Both amplitude and period of such fluctuations increased with the discharge power increasing from 40 to 80 W. Cycling repelling of NPs and formation of plasma voids are suggested as possible mechanisms for the observed phenomena.

Keywords: organosilicon nanoparticles, gas aggregation cluster source, light scattering, hexamethyldisiloxane

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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