THE EFFECT OF DEPOSITION OF METAL CHARGE COMPENSATION COATING ON SURFACE MORFOLOGY OF SAMPLES FOR SEM

1 ANDRSOVA Zuzana
Co-authors:
2 KEJZLAR Pavel 3 VOLESKY Lukas 4 PETRU Michal
Institutions:
1 Technical University of Liberec, Liberec, Czech Republic, EU, zuzana.andrsova1@tul.cz
2 Technical University of Liberec, Liberec, Czech Republic, EU, pavel.kejzlar@tul.cz
3 Technical University of Liberec, Liberec, Czech Republic, EU, lukas.volesky@tul.cz
4 Technical University of Liberec, Liberec, Czech Republic, EU, michal.petru@tul.cz
Conference:
9th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 18th - 20th 2017
Proceedings:
Proceedings 9th International Conference on Nanomaterials - Research & Application
Pages:
848-853
ISBN:
978-80-87294-81-9
ISSN:
2694-930X
Published:
8th March 2018
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
101 views / 29 downloads
Abstract

The paper deals with the study of layers applied by magnetic sputtering on samples for electron microscopy to obtain electric conductive surface. It describes the effect of different deposition parameters on the change of the surface morphology of the samples. The reference substrate is pure Si wafer; as the coating material was selected the most commonly used gold and platinum. Scanning Electron Microscopy and Atomic Force Microscopy were used for qualitative and quantitative evaluation of the structural changes.

Keywords: scanning electron microscopy, charge compensation, sputter coating

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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