ENVIRONMENTAL STABILITY OF NITROGEN CONTAINING PLASMA-POLYMERIZED HEXAMETHYLDISILOXANE FILMS

1 Kelarová Štěpánka
Co-authors:
1 PŘIBYL Roman 1 Homola Vojtěch 1 VÁCLAVÍK Richard 1 STUPAVSKÁ Monika 1 KELAR Lukáš 1 BURŠÍKOVÁ Vilma
Institution:
1 Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 61137 Brno, Czech Republic
Conference:
9th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 18th - 20th 2017
Proceedings:
Proceedings 9th International Conference on Nanomaterials - Research & Application
Pages:
842-847
ISBN:
978-80-87294-81-9
ISSN:
2694-930X
Published:
8th March 2018
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
14 views / 8 downloads
Abstract

Nitrogen incorporated organosilicon films were prepared by means of plasma enhanced chemical vapor deposition using capacitively coupled RF glow discharges in mixtures of hexamethyldisiloxane and nitrogen. The flow rate of nitrogen was 2-10 sccm and the flow rate of hexamethyldisiloxane was 0.3-0.4 sccm. The power supply of CCP was 50 W.The environmental stability of the deposited films was studied using confocal microscopy, spectroscopic ellipsometry and FTIR (Fourier Transform Infrared Spectroscopy). The humidity induced structure changes resulted in substantial change of mechanical properties of the studied films. The mechanical properties were studied using nanoindentation techniques.

Keywords: plasma polymer films, plasma enhanced chemical vapor deposition, FTIR, nanoindentation
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