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CORROSION BEHAVIOUR OF MG3TA2O8 PSEUDO-BINARY OXIDE DEPOSITION BY PULSED LASER DEPOSITION ON CARBON STEEL DISKS

1 BÎRDEANU Aurel - Valentin
Co-authors:
2 VAIDA Mirela 1 PERIANU Ion Aurel 3 MILOVANOVIC Dubravka 4 PETRONIC Sanja 2 BIRDEANU Mihaela
Institutions:
1 National R&D Institute for Welding and Material Testing – ISIM Timişoara, 20 M. Viteazu Ave., 300222 Timisoara, Romania, EU, valentin@isim.ro
2 National Institute for Research and Development in Electrochemistry and Condensed Matter, Plautius Andronescu Street, 300224 Timisoara, Romania, EU
3 University of Belgrade, Vinca Institute of Nuclear Sciences, Mike Alasa 12-14, P.O.Box 522, 11001 Belgrade, Serbia
4 Innovation Center, Faculty of Mechanical Engineering University of Belgrade, Kraljice Marije 16, Belgrade, Serbia
Conference:
9th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 18th - 20th 2017
Proceedings:
Proceedings 9th International Conference on Nanomaterials - Research & Application
Pages:
366-371
ISBN:
978-80-87294-81-9
ISSN:
2694-930X
Published:
8th March 2018
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
450 views / 149 downloads
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Abstract

Hydrothermally obtained Mg3Ta208 pseudo-binary nanomaterial from MgO and Ta2O5 (3:1) precursors was deposited using the pulsed laser deposition (PLD) technique on carbon steel disks. The PLD main processes parameters, i.e. the pulse energy and the deposition time were varied in order to determine the combination that ensures the best corrosion inhibition. Morphological investigations were carried out (scanning electron microscopy and atomic force microscopy). The anticorrosive properties of the deposited layers were studied in 0.3 M NaCI saline solution. The best anticorrosive protection was observed in the case of the deposited layers on carbon steel disk using the lower energy, i.e. 10mJ for a deposition time of 60s, i.e. 61.94 % inhibition efficiency.

Keywords: Mg oxide, hydrothermal, AFM, corrosion, PLD.

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