CHARACTERISATION OF SURFACE AND BULK PROPERTIES OF POLYMER-LIKE THIN FILMS PREPARED USING PECVD ON VARIOUS SUBSTRATES

1 KELAR Lukáš
Co-authors:
1 BURŠÍKOVÁ Vilma
Institution:
1 Department of Physical Electronics, Faculty of Science, Masaryk University, Brno, Czech Republic, kelar@physics.muni.cz
Conference:
7th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 14th - 16th 2015
Proceedings:
Proceedings 7th International Conference on Nanomaterials - Research & Application
Pages:
94-99
ISBN:
978-80-87294-59-8
ISSN:
2694-930X
Published:
11th January 2016
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
794 views / 290 downloads
Abstract

The aim of the present work was to deposit thin polymer-like films fulfilling several criteria in order to enable their industrial application as protective coatings on various materials, for example plastic substrates. Therefore the films have to be stable, wear resistant with good adherence to the substrate materials and they have to be resistant against mechanical damage. The thin films presented in this work were prepared from mixture of hexamethyldisilazane and nitrogen using plasma enhanced chemical vapor deposition technique.The silicon, glass and polycarbonate substrates were plasma treated in low pressure glow discharge using hydrogen or nitrogen discharge in order to increase the adhesion of the coatings to the substrates. An extended study of surface free energy on polycarbonate was carried out in order to find the optimum substrate surface treatment process before deposition of thin film. Once the process of pre-treatment was optimized, large number thin films was prepared with various mechanical and surface properties.

Keywords: PECVD, polycarbonate, glass, mechanical properties, TDS, XPS, HMDSZ

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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