Carbon nanowalls (CNW) thin films are very promising for various electrochemical and energy storage applications. Its high surface area, porosity and good electrical conductivity make it an ideal electrode material for electrochemical sensors, supercapacitors and batteries or for ohmic contacts of GaN transistors. In this work, hot filament chemical vapour deposition (HFCVD) technique was used to grow CNW on silicon substrates using various gas flows of methane and hydrogen. Raman spectroscopy and SEM were used to perform the structural and morphology characterization of the prepared samples. The ID / IG ratio calculated from Raman spectra and its dependence on the CH4 / H2 ratio is described and discussed. We found that, the size and disorder of the multi-layer graphene structure of the deposited CNW thin films is strongly affected by the methane to hydrogen ratio.Keywords: Carbon Nanowalls, HF CVD, Raman spectroscopy
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