ANALYSIS OF CARBON NANOWALS PREPARED BY HOT FILAMENT CHEMICAL VAPOUR DEPOSITION

1 MICHNIAK Pavol
Co-authors:
1 MARTON Marián 1 BEHÚL Miroslav 1 REDHAMMER Robert 2 VANKO Gabriel
Institutions:
1 Institute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology in Bratislava, Ilkovičova 3, 812 19 Bratislava, Slovakia, EU, pavol.michniak@stuba.sk
2 Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04, Bratislava, Slovakia, EU
Conference:
7th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 14th - 16th 2015
Proceedings:
Proceedings 7th International Conference on Nanomaterials - Research & Application
Pages:
143-148
ISBN:
978-80-87294-59-8
ISSN:
2694-930X
Published:
11th January 2016
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
34 views / 5 downloads
Abstract

Carbon nanowalls (CNW) thin films are very promising for various electrochemical and energy storage applications. Its high surface area, porosity and good electrical conductivity make it an ideal electrode material for electrochemical sensors, supercapacitors and batteries or for ohmic contacts of GaN transistors. In this work, hot filament chemical vapour deposition (HFCVD) technique was used to grow CNW on silicon substrates using various gas flows of methane and hydrogen. Raman spectroscopy and SEM were used to perform the structural and morphology characterization of the prepared samples. The ID / IG ratio calculated from Raman spectra and its dependence on the CH4 / H2 ratio is described and discussed. We found that, the size and disorder of the multi-layer graphene structure of the deposited CNW thin films is strongly affected by the methane to hydrogen ratio.

Keywords: Carbon Nanowalls, HF CVD, Raman spectroscopy
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