COMPARISON OF HMDSO AND HMDSZ THIN FILMS GROWTH UNDER DUSTY PLASMA CONDITIONS

1 PŘIBYL Roman
Co-authors:
1 KELAROVÁ Štěpánka 1 ZÁBRANSKÝ Lukáš 1 BURŠÍKOVÁ Vilma
Institution:
1 Faculty of Science, Department of Physical Electronics, R&D Center for Plasma and Nanotechnology Surface Modifications, CEPLANT, Brno, Czech Republic, EU, romanpribyl@mail.muni.cz
Conference:
12th International Conference on Nanomaterials - Research & Application, Brno, Czech Republic, EU, October 21 - 23, 2020
Proceedings:
Proceedings 12th International Conference on Nanomaterials - Research & Application
Pages:
541-546
ISBN:
978-80-87294-98-7
ISSN:
2694-930X
Published:
28th December 2020
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
286 views / 148 downloads
Abstract

The present study is focused on the preparation of thin films by plasma enhanced chemical vapor deposition (PEDCV) in capacitively coupled plasma (CCP). Thin films were deposited from a mixture of oxygen and hexamethyldisiloxane (HMDSO) or hexamethyldisilazane (HMDSZ). Both monomers are well known and enable to prepare films with excellent properties such as high hardness, good abrasion resistance, hydrophobicity, and antibacterial properties. Also, these monomers are known for the creation of complex structures in plasma. This phenomenon is so-called dusty plasma. The main aim of the present work was to prepare a comparative study on the dust formation in both monomers. Complex study of surface and mechanical properties and chemical composition was done by a wide range of analytical instruments such as atomic force microscopy (AFM), nanoindentation technique, confocal microscopy, infrared spectroscopy with Fourier transformation (FTIR), stylus profilometer, and surface energy evaluation system (SEE system).

Keywords: Thin films, PECVD, dusty plasma, surface properties

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