MODIFICATION OF VARIOUS POLYMER SURFACES USING ATMOSPHERIC PRESSURE REDUCING PLASMA

1 DOUBKOVÁ Zdeňka
Co-authors:
1 TUČEKOVÁ Zlata 1 KELAR Jakub 1 KRUMPOLEC Richard 1 ZEMÁNEK Miroslav
Institution:
1 R&D Centre for Low-Cost Plasma and Nanotechnology Surface Modifications, Masaryk University, Kotlářská 267/2, 611 37 Brno, Czech Republic, z.doubkova@mail.muni.cz
Conference:
10th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 17th - 19th 2018
Proceedings:
Proceedings 10th International Conference on Nanomaterials - Research & Application
Pages:
688-693
ISBN:
978-80-87294-89-5
ISSN:
2694-930X
Published:
28th February 2019
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
391 views / 236 downloads
Abstract

This paper presents the results of surface modification of polymers induced by atmospheric pressure non-isothermal plasma generated in reducing atmosphere. The technology based on diffuse coplanar surface barrier discharge (DCSBD) was used with the aim to achieve highly hydrophobic surfaces. One rigid (polymethylmethacrylate-PMMA) and three flexible polymers (PMMA, polytetrafluoroethylene-PTFE and polyethylene terephthalate-PET) were modified by plasma. The changes in wetting phenomena and surface free energy were observed depending on plasma treatment conditions. The most significant modification occurred on flexible PMMA and PTFE. Using pure hydrogen plasma, we were able to achieve an increase of water contact angle up to ~115° from the original value 78° (untreated PMMA). On the contrary, the water contact angle on PTFE decreased to ~91° from the value 109° (untreated PTFE). Observed etching process on polymer surfaces and the changes in surface roughness were detected by a scanning electron microscopy (SEM) and atomic force microscopy (AFM).

Keywords: Non-isothermal plasma, reduction atmosphere, PMMA, PET, PTFE

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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