HYDROGEN PLASMA TREATMENT OF ZNO THIN FILMS

1,2 CHANG Yu-Ying
Co-authors:
1 NEYKOVA Neda 1 STUCHLIK Jiří 1 PURKRT Adam 1,2 REMES Zdeněk
Institutions:
1 Institute of Physics CAS, Prague, Czech Republic, EU, chang@fzu.cz
2 Faculty of Biomedical Engineering CTU in Prague, Kladno, Czech Republic, EU
Conference:
8th International Conference on Nanomaterials - Research & Application, Hotel Voronez I, Brno, Czech Republic, EU, October 19th - 21st 2016
Proceedings:
Proceedings 8th International Conference on Nanomaterials - Research & Application
Pages:
161-165
ISBN:
978-80-87294-71-0
ISSN:
2694-930X
Published:
17th March 2017
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
26 views / 8 downloads
Abstract

ZnO is an attractive wide band gap semiconductor with large exciton binding energy, high refractive index, high biocompatibility and diversety of nanostructure shapes which makes it suitable for many applications in the optoelectronic devices, optical sensors, and biosensors. We study the effect of hydrogen plasma treatment of the nominally undoped ZnO thin film deposited by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma. The SEM images show that the crystal size increases with film thickness. We confirm, that the electrical conductivity significantly increases after hydrogen plasma treatment by 4 orders of magnitude. Moreover, the increase of the infrared optical absorption, related to free carrier concentration, was detected below the optical absorption edge by the photothermal deflection spectroscopy.

Keywords: ZnO, reactive magnetron sputtering, hydrogen plasma treatment.
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