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This paper reports on anti-reflective (ARCs) and UV rejection coatings on variety of surfaces. The anti-reflective coatings have evolved into highly effective reflectance and glare reducing surfaces. The hindered amine light stabilizers (HALS) are very effective inhibitors against free radical included degradation of polymers at low and medium temperatures. HALS are based on 2,2,6,6,-tetramethyl-piperidine derivates. HALS can be categorized according their molecular weight, with low molecular weight (MW) about 200 to 500 g/mol (low MW HALS) and those with molecular weight of 2000 or higher as high MW HALS. These classes have different rates of diffusion in the polymer matrix, this is important factor in protecting polymers from UV radiation. Very low HALS don’t provide much thermal stability. Others like benzotriazoles and benzophenones are cost effective and provide better performance than other types of UV stabilizers. Benzotriazoles are widely used in high temperature resins. The antireflection coatings have usually two and more layers, but there are a single layer ARC. The single layer ARCs are based on silica nanoparticles with polymer substrate. A broad-spectrum light absorbing medium could be coated by SiO2, SiO, TiO2, ZrO2, Ta2O5 or Si3O4 or by spin coating method. One of the layers could be an electrically conductive metal oxide, UV-stabilized polymers or material with low-refractive index. These layers can be laminated. The aim of this study is to find a pathway for structure with low volatile organic compound (VOC) coating and second goal is to formulate novel UV rejection ARC.
Keywords: Surface, anti-reflectivity coating, UV rejection© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.