EFFECT OF IMPLANTATION OF C, SI AND CU INTO ZRNB NANOMETRIC MULTILAYERS

1 DAGHBOUJ Nabil
Co-authors:
1,2 KARLÍK Miroslav 3 LÖRINČÍK Jan 4 POLCAR Tomáš 5 CALLISTI Mauro 6 HAVRÁNEK Vladimír
Institutions:
1 Department of Materials, Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Trojanova 13, 120 00 Prague 2, Czech Republic, EU, Nabil.Daghbouj@fjfi.cvut.cz
2 Department of Physics of Materials, Faculty of Mathematics and Physics, Charles University, Ke Karlovu 5, 121 16 Prague 2, Czech Republic, EU, Miroslav.Karlik@fjfi.cvut.cz
3 Research Centre Řež, 250 68 Husinec-Řež, Czech Republic, EU, jan.lorincik@cvrez.cz
4 Department of Control Engineering, Faculty of Electrical Engineering, Czech Technical University in Prague, Technická 2, 160 00 Prague 6, Czech Republic, EU, polcar@fel.cvut.cz
5 Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge, CB3 0FS, United Kingdom, EU, M.Callisti@soton.ac.uk
6 Nuclear Physics Institute CAS, 250 68 Řež, Czech Republic, EU, Havranek@ujf.cas.cz
Conference:
28th International Conference on Metallurgy and Materials, Hotel Voronez I, Brno, Czech Republic, EU, May 22nd - 24th 2019
Proceedings:
Proceedings 28th International Conference on Metallurgy and Materials
Pages:
944-949
ISBN:
978-80-87294-92-5
ISSN:
2694-9296
Published:
4th November 2019
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
38 views / 11 downloads
Abstract

Sputter-deposited Zr/Nb nanometric multilayer films with a periodicity (L) in the range from 6 to 167 nm were subjected to carbon, silicon and copper ion irradiation with low and high fluences at room temperature. The ion profiles, mechanical proprieties, and disordering behavior have been investigated by using a variety of experimental techniques (Secondary Ion Mass Spectrometry - SIMS, nanoindentation, X-ray diffraction - XRD, and scanning transmission electron microscopy - STEM). On the STEM bright field micrographs there is damage clearly visible on the surface side of the multilayer; deeper, the most damaged and disordered zone, located close to the maximum ion concentration, was observed. The in-depth C and Si concentration profiles obtained from SIMS were not affected by the periodicity of the nanolayers. This is in accordance with SRIM simulations. XRD and electron diffraction analyses suggest a structural evolution in relation to L. After irradiation, Zr (0002) and Nb (110) reflexions overlap for L=6 nm. For the periodicity L> 6 nm the Zr (0002) peak is shifted to higher angles and Nb (110) peak is shifted to lower angles.

Keywords: Zr/Nb multilayers, ion irradiation, strain, XRD, SIMS
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