Titanium dioxide (TiO2) is one of the most useful materials in various applications related to catalysis, electronics, photonics, sensing, and medicine. TiO2 is characterized by high chemical stability, outstanding optical and electrical properties, a non-toxic nature, and ease of mass production, and this is what causes it to be successfully used as a photocatalyst in many fields such as anti-bacterial applications, water purification, the decomposition of various organic pollutants, and solar cell applications TiO2 thin films can be prepared by a variety of methods, such as the sol–gel method, pulsed laser deposition, chemical vapour deposition, spray pyrolysis, and sputtering techniques. The magnetron sputtering method can produce highly homogeneous films characterized by good adhesion to the substrate. This method also offers the advantage of depositing films on a large scale area, which makes it suitable for industrial applications. TiO2 coatings prepared by magnetron sputtering method have two types of crystallographic structures: rutile and anatase, which are characterized by difference properties. For example, anatase can be characterized by better photocatalytic properties, while rutile has a higher absorbance property than anatase. Depending on the contribution of particular phases in the crystalline structure, the TiO2 coating is characterized by different functional properties. The article presents the influence of the chemical composition of the process atmosphere on phase composition TiO2 coatings obtained by reactive magnetron sputtering. The research methods also include the microstructure and the mechanical properties analysis of the obtained coating.Keywords: Titanium dioxide, magnetron sputtering, PVD
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