from the conferences organized by TANGER Ltd.
Due to the high surface to volume ratio, the particles’ surface properties modification defines its properties in general, which is crucial for their use. From this point of view, plasma processing or high temperature annealing can be considered as the universal techniques for efficient modification of materials in the form of powder. In this study, the silicon dioxide microparticles have been treated in a hydrogen, oxygen or vacuum by low temperature plasma or annealing. The change of SiO2 microparticles properties was investigated by photoluminescence spectroscopy at room and low temperature. High temperature annealing in hydrogen induced under UV excitation photoluminescence in the near UV and visible light indicating the change of defect states on the surface of the microparticles. We believe that observed findings clearly demonstrate useful method for analysis of SiO2 microparticles surface modification attractive also for fundamental research.
Keywords: Silicon dioxide, plasma treatment, annealing, photoluminescence, measuring setup© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.